Poster Session

Session 1 - Advanced Technologies: Plasma and Ion Sources by Vacuum Deposition

Chairmen: Prof. Dr. G. Bräuer, Dr. J. Strümpfel

Session 1.08

Linear Ion Sources - New Designs and Processes for Improvements in Product Industrial Scale

V. Bellido-Gonzalez1, M.A udronis1, R. Brown1, D. Monaghan1, S. Williams2
1Gencoa Ltd., Physics Road, Liverpool [United Kingdom]; 2Gencoa, San Francisco [USA]

Session 1.09

Usage of magnetron pulse DC power supplies for various vacuum technological processes

V. Kozlov, E. Machevskis, SIDRABE, Riga [Latvia]

Session 2 - Atmospheric Pressure Coatings [CVD, Wet Chemical Processing]

Chairmen: Dr. J. Pütz, Prof. D. Sheel

Session 2.09

Photocatalytic Active Titanium Dioxide Coatings Prepared by Atmospheric Pressure Processes

T. Abendroth, F. L. Toma, H.Althues, B. Leupolt, L. M. Berger, S. Kaskel
Fraunhofer Institute for Material and Beam Technology IWS, Dresden [Germany]

Session 2.11

Zinc Acetylacetonate as MOCVD Precursor for ZnO: the Effect of Hydration on the Evaporation Behavior

M. J. Theelen, S. Kouijzer, K.Timmer, G. J. J. Winands, P. Poodt
TNO Science and Industry, Materials Technology, Eindhoven [The Netherlands]

Session 2.12

Deposition of Tin Oxide and Fluorine-Doped Tin Oxide by Atmospheric Pressure CVD

T. Abendroth, H. Althues, S. Kaskel
Fraunhofer Institute for Material and Beam Technology IWS, Dresden [Germany]

Session 2.13

Deposition of Indium Tin Oxide by APCVD

J. M. Gaskell, D. W. Sheel, H. Yates
Functional Materials, Cockcroft Building, University of Salford, Manchester [United Kingdom]

Session 2.14

Surface Structure Modification of Tin Oxide for Thin Film Photovoltaic Applications via Dielectric Barrier Discharge Etching Spray

J. L. Hodgkinson, D. W. Sheel, M. Thomson
The University of Salford, Functional Materials Department, Salford [United Kingdom]

Session 2.15

A Spray Pyrolysis Deposition Technique for Thin-Film Formation and Its Application to Preparation of Transparent Conductive Oxides

S. Kaneko, S. Kawasaki, P.V.V. Jayaweera and G. R. A. Kumara
SPD Laboratory,Hamatsu, Japan

Session 2.16

Micropatterning using atmospheric pressure plasma processes

M. Thomas, J. Borris, M. Eichler, C.-P. Klages
Fraunhofer Institute for Surface Engineering and Thin Films IST, Braunschweig, Germany

Session 2.19

Thin Functional Films on Glass or Plastics by Combustion CVD

T. Struppert, A. Heft, B. Grünler
INNOVENT e.V., Departement of Surface Engineering, Jena, Germany

Session 2.20

Development of Atmospheric Linear Plasma Source for High Speed Surface Coating

R. Sasaki, S. Yamasaki, H. Hirai, M. Ichikawa, H. Miyahara, A. Okino
Department of Energy Sciences, Tokyo Institute of Technology, Yokohama, Japan

Session 3 - Displays, Flexible Electronics and Barriers

Chairmen: R. Shimshock, C.I.M.A. Spee

Session 3.09

Thermophysical Properties of Organic Films Used for Organic Light-Emitting Diodes

Dr. O. Nobuto, Kazuki Kato1, Norihiro Ito2, Takashi Yagi3, Naoyuki Taketoshi3, Tetsuya Baba3, Yasushi Sato1, Yuzo Shigesato1,
1Graduate school of Science and Engineering, Aoyama Gakuin University, Kanagawa [Japan]; 2Panasonic Electric Works Co., Ltd., Kanagawa [Japan]; 3National Metrology Institute of Japan, AIST, Aoyama Gakuin, University, Kanagawa [Japan]

Session 4 - Process Control Methods and Characterization

Chairmen: Dr. K. Makita, Dr. G. Schottner

Session 4.07

Latest Developments in High Speed Spectroscopy

S. Piecha, H.S. Eckhardt, M. Holzapfel
tec5 AG, Sales Department, Oberursel, Germany

Session 4.09

Particle-in-Cell Monte Carlo Analysis of Anomalous Target Erosion in Magnetron Sputtering

M. Siemers , A. Pflug, B. Szyszka
Fraunhofer Institute for Surface Engineering and Thin Films (IST), Braunschweig, Germany

Session 4.10

Magnetron Sputtering Modes during Pulsed Deposition Process

K. Krowka, A. Wiatrowski, W.M. Posadowski
Wroclaw University of Technology, Faculty of Microsystems, Electronics and Photonics, Wroclaw, Poland

Session 4.11

High Rate Deposition of Mixed Oxides by Controlled Reactive Magnetron-Sputtering from Metallic Targets

S. Bruns1, M. Vergöhl1, O. Werner1, T. Wallendorf2
1Fraunhofer Institute for Surface Engineering and Thin Films, Braunschweig, Germany; 2IfU Diagnostic Systems GmbH, Lichtenau, Germany

Session 4.12

Particle Generation during Reactive Sputtering of SiO2 with Planar and Cylindrical Magnetrons

M. Vergöhl, D. Rademacher
Fraunhofer Institute for Surface Engineering and Thin Films, Braunschweig, Germany

Session 4.13

Electrochromic Properties of WO3, V2O5 and TiO2 Prepared by Hydrothermal Growth at 95 °C

D. Vernardou1,2,3, H. Drosos4, E. Spanakis2,3,6, E. Koudoumas1,5, C. Savvakis1,2, N. Katsarakis1,2,6
1Center of Materials Technology and Laser, School of Applied Technology, Technological Educational Institute of Crete, Heraklion, Crete, Greece; 2Science Department, School of Applied Technology, Technological Educational Institute of Crete, Heraklion, Crete, Greece; 3Department of Materials Science and Technology, University of Crete, Heraklion, Crete, Greece; 4Mechanical Engineering Department, School of Applied Technology, Technological Educational Institute of Crete, Heraklion, Crete, Greece; 5Electrical Engineering Department, School of Applied Technology, Technological Educational Institute of Crete, Heraklion, Crete, Greece; 6Institute of Electronic Structure and Laser, Foundation for Research & Technology-Hellas, Heraklion, Crete, Greece

Session 5 - Thin Film Properties

Chairmen: Prof. A. Roos, Prof. H.-K. Pulker

Session 5.09

Measurement of Photocatalytic Properties of Thin-Films Using Novel Solid-State Luminescent Dyes

T. Graumann, F. Neumann
Fraunhofer Institute for Surface Engineering and Thin Films IST, Braunschweig, Germany

Session 5.10

Light-Induced Photocatalytic Degradation of Stearic Acid by C-Axis Oriented ZnO Nanowires Grown at Mild Temperatures

G. Kenanakis1,2,3, C. Savvakis2, N. Katsarakis1,2
1FORTH-IESL, Heraklion, Crete, Greece; 2TEI of Crete, Heraklion, Crete, Greece; 3University of Crete, Department of Chemistry, Heraklion, Crete, Greece

Session 5.11

Preparation of Photocatalytic TiO2-Coatings by Hollow Cathode Gas-Flow Sputtering

D. Koeßler, K. Ortner, M. Höfer, B. Szyszka, T. Jung
Fraunhofer Institute for Surface Engineering and Thin Films IST, Germany

Session 5.12

Synchronal Pulsed RF Superimposed DC Sputtering of Aluminum Doped Zinc Oxide (ZnO:Al)

B. Heimke, U. Hartung, T. Kopte, M. Junghähnel, R. Nyderle
Fraunhofer Institute for Electron Beam and Plasma Technology FEP, Dresden, Germany

Session 5.13

Properties of Transparent Conductive Niobium Doped Titania (TNO ) Thin Films Deposited by Large Area DC and Pulsed DC Sputtering

M. Junghähnel, B. Heimke, U. Hartung, T. Kopte, O. Zywitzki
Fraunhofer Institute for Electron beam and Plasma Technology FEP, Dresden, Germany

Session 5.15

Electrical, Optical, and Structural Properties of Ga-Doped ZnO Thin Films Affected by Post-Deposition Thermal Annealing

H. Makino, T. Yamada, N. Yamamoto, T. Yamamoto
Research Institute, Kochi University of Technology, Kami, Japan

Session 5.16

New Approach Towards an Optimized Light Trapping Morphology of Al-Doped ZnO Films

V. Sittinger1, W. Dewald1, B. Szyszka1, F. Säuberlich2, B. Stannowski2
1Fraunhofer Institute for Surface Engineering and Thin Films IST, Braunschweig, Germany; 2Sunfilm AG, OT Thalheim, Bitterfeld-Wolfen, Germany

Session 5.17

Nanostructured Fluorocarbon Plasma Polymers

O. Kylián , M. Drábik, O. Polonskyi, J. Cechvala, A. Artemenko, I. Gordeev, A. Choukourov, D.Slavínská, I. Matolínová, H. Biederman
Charles University in Prague, Faculty of Mathematics and Physics, Prague, Czech Republic

Session 5.18

Investigation of Shrinkage and Crack Phenomena on Ophthalmic Lens by Using Cycle Test of UV Radiation and High Humidity

N. Tadokoro1, K. Jaisupap2, A. Sukbumperng2, S. Pannakarn2, S. Khraikratoke2, N. Iwata2
1Lens Technology center, VC Company, HOYA Corporation, Tokyo, Japan; 2PL Technical department, HOYA Lens Thailand, Ayutthaya, Thailand

Session 5.19

Preparation and Characterization of CuIMeIII O2

C. Polenzky, K. Ortner, B. Szyszka
Fraunhofer Institute for Surface Engineering and Thin Films IST, Braunschweig, Germany

Session 5.21

Optical Properties of Glass Surface Layer Modified by Surface Ion Exchange Process

O. N. Sidelnikova1, G. A. Pozdnyakov2, A. N. Salanov3
1Institute of Solid State Chemistry and Mechanochemistry, Novosibirsk, Russia; 2Khristianovich Institute of Theoretical and Applied Mechanics, Novosibirsk, Russia; 3Boreskov Institute of Catalysis, Novosibirsk, Russia

Session 5.22

Optical Properties of Glass Surface Layer Modified by Surface Ion Exchange Process with Thin Gold Layer

O. N. Sidelnikova1, G. A. Pozdnyakov2, A. N. Salanov3, A. N. Serkova3
1Institute of Solid State Chemistry and Mechanochemistry, Novosibirsk, Russia 2Christianovich Institute of Theoretical and Applied Mechanics, Novosibirsk, Russia 3Boreskov Institute of Catalysis, Novosibirsk, Russia

Session 5.23

Properties of TiO2 Films Deposited by Bipolar Reactive HiPIMS

M. Vergöhl, S. Bruns
Fraunhofer Institute for Surface Engineering and Thin Films IST, Braunschweig, Germany

Session 5.24

Mechanical Characterization of Hard Coating on Polycarbonate Substrate with Finite Element Analysis

T. W. Boentoro, B. Szyszka
Fraunhofer Institute for Surface Engineering and Thin Films IST, Braunschweig, Germany

Session 5.25

Synthesis of MoSe2 and MoS2 on Mo/Polyimide Films for Flexible Cu(In,Ga)(Se,S)2 Based Solar Cells

A. Bollero1, L. Kaupmees2, T. Raadik2, M. Grossberg2, S. Fernández1
1Dep. of Energy, CIEMAT, Madrid, Spain; 2Dep. of Materials Science, Tallinn University of Technology (TUT), Tallinn 19086, Estonia

Session 5.26

Novel Two-Step NH4Cl Wet-Chemical Etching Method to Improve ZnO:Al Surface Texture for Applications to Flexible Thin-Film Silicon Solar Cells

S. Fernández1, O. de Abril2, F. B. Naranjo3, J. J. Gandía1
1CIEMAT, Departamento de Energías Renovables, Madrid. Spain; 2ISOM and Departamento de Física Aplicada, Escuela Técnica Superior de Ingenieros de Telecomunicación, Universidad Politécnica de Madrid, Madrid, Spain; 3Grupo de Ingeniería Fotónica, Universidad de Alcalá, Departamento de Electrónica, Alcalá de Henares, Madrid, Spain

Session 5.27

The Deposition of Optical Multilayer Films on Plastic Substrate by Reactive Pulse Magnetron Sputtering

T. Fukagawa1, Y. Kato1, H. Bartzsch2, K. Suzuki3
1TOKAI OPTICAL CO., LTD., R&D Department, Aichi, Japan; 2Fraunhofer Institute for Electronbeam and Plasma Technology, Dresden, Germany; 3Consultant / Surftech Transnational CO., LTD., Tokyo, Japan

Session 5.28

Microstructure Analysis of Ag Thin Films Deposited by Low-Voltage Sputtering

K. Kato, H. Omoto, A. Takamatsu
Central Glass Co. Ltd., Glass Research Center, Matsusaka-City, Japan

Session 5.29

Light-Induced Photocatalytic Degradation of Azo Dyes by ZnO and TiO2 Nanostructures Deposited Onto Polymer Substrates at Mild Temperatures

G. Kenanakis1,2,3, N. Lyroni4, D. Vernardou2,4, N. Katsarakis1,2
1FORTH-IESL, Heraklion, Crete, Greece; 2TEI of Crete, Heraklion, Crete, Greece; 3University of Crete, Heraklion, Crete, Greece; 4University of Crete, Heraklion, Crete, Greece

Session 5.31

Observation of Carbon Nanotubes Formed at Room Temperature as a Result of Detachment of Gold Nanolayers from the Glass Substrate

O. N. Sidelnikova1, A. N. Salanov Aleksey2, A. N. Serkova2
1Institute of Solid State Chemistry and Mechanochemistry, Novosibirsk, Russia; 2Boreskov Institute of Catalysis, Novosibirsk, Russia

Session 5.32

Imaging Application of Lubricants on Ophthalmic Lens by AFM

N. Tadokoro1, S. Pannakarn2, S. Khraikratoke2, H. Kamura1, N. Iwata2
1Lens Technology center, VC Company, HOYA Corporation, Tokyo, Japan; 2PL Technical department, HOYA Lens Thailand, Ayutthaya,Thailand

Session 5.33

Ophthalmic Plastic Lens with Anti-Static Property Using Carbon Nanotubes

H. Takahashi1, T. Fukagawa1, T. Hashimoto2
1TOKAI OPTICAL CO., LTD., R&D department, Aichi, Japan; 2MEIJO NANO CARBON CO., LTD., Aichi, Japan

Session 6 - Architectural, Automotive & other Applications

Session 6.07

Plasma Deposition of Au-SiO2 Multilayers for Surface Plasmon Resonance Based Red Colored Coatings

H. T. Beyene1,2, F. D. Tichelaar3, M. C. M. van de Sanden2, M. Creatore2
1Materials innovation institute (M2i), Delft, The Netherlands; 2Department of Applied Physics, Eindhoven University of Technology, Eindhoven, The Netherlands; 3Kavli Institute of Nanoscience, Delft University of Technology, Delft, The Netherlands

Session 6.08

Assessment of Coevaporated CuS Thin Films on Glass Substrates for Solar Control Coating Applications

A. Bollero1, K. Zuzek Rozman2, M. Grossberg3, S. Fernández1
1Dep. of Energy, CIEMAT, Madrid, Spain; 2Dep. for Nanostructured Materials, Jozef Stefan Institute, Ljubljana, Slovenia; 3Dep. of Materials Science, Tallinn University of Technology (TUT), Tallinn, Estonia

Session 6.11

Organic Layers for UV Protection of Polycarbonate

C. Präfke, U. Schulz, N. Kaiser
Fraunhofer Institute of Applied Optics and Precision Engineering IOF, Optical Coatings, Jena, Germany

Session 6.12

Some Typical Defects at the Interfaces of Silver-Consisted Thin Film Coatings, Copper Filaments and Glasses on Automotive Windscreens

L. A. Gömze1, L. N. Gömze2
1University of Miskolc, Department of Ceramics and Silicate Engineering, Miskolc, Hungary 2IGREX Ltd., Igrici, Hungary

Session 7 - Solar Applications

Session 7.09

High-Rate Sputter-Etched Zinc Oxide from Tube Targets for Photovoltaic Application

E. Bunte1, H. Zhu1,2, J. Owen1, J. Hüpkes1
1IEF5-Photovoltaics, Research Centre Jülich, Jülich, Germany; 2Engineering Research Centre for Nanophotonics and Advanced Instrument, Ministry of Education, East China Normal University, Shanghai, P. R. China

Session 7.10

Reactive Sputtering Process and Suitable Etching Process of Zinc Oxide for Silicon Thin Film Solar Cells

J. Hüpkes, H. Zhu, J. I. Owen, G. Jost, E. Bunte
Forschungszentrum Jülich GmbH, IEF5-Photovoltaik, Jülich, Germany

Session 7.11

Improving the Electrical Properties of DC-Sputtered ZnO:Al by Thermal Post Deposition Treatment

M. Wimmer, F. Ruske, S. Scherf, B. Rech
Helmholtz Zentrum Berlin für Materialien und Energie, Institut für Silizium-Photovoltaik, Berlin, Germany

Session 7.12

Managing Arcs in Large Area Sputtering Applications

D. Carter, H. Walde, K. Nauman
Advanced Energy Industries Inc, Fort Collins, CO, USA

Session 7.13

Significant Reduction of Arc Caused Sputtering Losses and Other Improvements in Sputtering Technology by New Solutions in DC Power Supplies on Example of AZO Non-Pulsed DC Sputtering

P. Lach, W. Glazek, P. Ozimek
Huettinger Electronic sp. z o.o., Zielonka, Poland

Session 7.14

The Effect of Voltage Reversal on Nodule Formation During Sputtering of Aluminum-Doped Zinc Oxide

K. Nauman
Advanced Energy Industries, Inc., Fort Collins, CO, USA

Session 7.15

Elaboration of Dye-Sensitized ZnO Solar Cells by Wet Chemical Processes

S. Fujihara, S. Ueno, M. Hosokawa, S. Inoue
Keio University, Department of Applied Chemistry, Yokohama, Japan

Session 7.19

Amorphous and Microcrystalline Silicon Based Thin-Film Solar Cells and Modules Deposited at High Deposition Rates

T. Kilper, J. Kirchhoff, J. Kroll, J. Noll, W. Reetz, G. Schöpe, C. Zahren, A. Gordijn
Forschungszentrum Jülich GmbH, Institute of Energy Research (IEF5-Photovoltaik), Jülich, Germany

Session 7.20

Reactive Magnetron Sputtering of CuInS2 Absorbers for Thin Film Solar Cells: A Time Resolved and In-Situ-ED XRD Study

S. Seeger, K. Ellmer
Helmholtz-Zentrum Berlin, Dept. Solar Fuels, Berlin, Germany

Session 7.21

New Thin Film Solar Cell Concepts Based on Silicon Nanowires on Glass as Well as in Polymer Matrix

V. A. Sivakov1, B. Hoffmann1, G. Brönstrup1, F. Voigt, M. Pietsch2, S. Christiansen1,2
1Institut für Photonische Technologien, Jena, Germany; 2Max Planck Institut für die Physik des Lichts, Erlangen, Germany

Session 7.22

Vindico PV+: Clever Combination Increases Solar Cell Efficiency

P. Bastianen
Vindico Surface Technologies B.V., Hardinxveld-Giessendam, The Netherlands

Session 7.23

Hybrid Materials for Application in Anti-Reflective Coatings

N. Arfsten, R. Habets, H. Langermans, A. Overbeek, B. Plum, R. de Rijk, J. Scheerder, P. Buskens
DSM Functional Coatings, Geleen, Netherlands

Session 7.24

Numerical Simulation of Thin Film Silicon Solar Cells on Glass

K. v. Maydell, J. Lacombe, S. Geißendörfer
NEXT ENERGY / EWE-Forschungszentrum für Energietechnologie e.V., Oldenburg, Germany

Session 7.25

RuS2 Thin Films for the Catalytic Oxidation of Water, Prepared by Reactive Magnetron Sputtering

S. Brunken, C. Zachäus, P. Bogdanoff, K. Ellmer, S. Fiechter
Helmholtz-Zentrum Berlin für Materialien und Energie, Institute for Solar Fuels and Energy Storage Materials, Berlin, Germany

Disclaimer: Program may be subject to change without notice.