Tuesday, June 15

Session 2 - Atmospheric Pressure Coatings and Processes

Chairmen: Dr. J. Pütz, Prof. D. Sheel

8:30 - 9:00 a. m. Keynote lecture

2.01 Atmospheric Pressure Plasma Vapour Coatings

Prof. dr. ir. M.C.M. R. van de Sanden, Eindhoven University of Technology [The Netherlands]

9:00 - 9:20 a. m.

2.02 Deposition of Zinc Oxide Using an Atmospheric, Low Temperature Plasma Process

Miriam Theelen M. Sc., TNO Science and Industry [The Netherlands]

9:20 - 9:40 a. m.

2.03 New Coating Technology for Producing In-Line TCO-Glass

J. Pimenoff, Beneq [Finland]

9:40 - 10:00 a. m.

2.04 Biocidal Silica/Silver Films by Atmospheric Pressure Chemical Vapour Deposition

Prof. D. Sheel, CVD Technologies Ltd. [Great Britain]

10:00 - 10:30 a. m.

Coffee Break

10:30 - 10:50 a. m. Invited lecture

2.05 Design of Wet AR Coatings Using Functional Nanoparticles

S. Murai and Y. Ishihara, JGC Catalysts & Chemicals Ltd. [Japan]

10:50 - 11:10 a. m.

2.06 Carbon Nanotube Multiscale Composites for Transparent Conductive Films

Dr. I. Kolaric, Fraunhofer IPA [Germany]

11:10 - 11:30 a. m.

2.07 IR-Optical and Structural Characterization of Sol-Gel Deposited TCO Coatings

M. Rydzek, Bavarian Center of Applied Energy Research, Würzburg [Germany]

11:30 - 11:50 a. m.

2.08 Electroplating of Electrical Circuitry on Optoelectronic Windows for Thin Film Solar Cells on Foil

Dr. A. Hovestad, TNO Science & Industry [The Netherlands]

11:50 a. m. - 1:00 p. m.

Lunch Break

Session 3 - Displays, Flexible Electronics and Barriers

Chairmen: R. Shimshock, C.I.M.A. Spee

1:00 - 1:30 p. m. Keynote lecture

3.01 Flexible OLEDs for Lighting

Dr. A.M.B. T. van Mol, Holst Center/TNO [The Netherlands]

1:30 - 1:50 p. m.

3.02 Technology and Equipment for Roll-to-Roll-Processing of Small Molecule OLEDs for Lighting Applications

C. Deus, VON ARDENNE Anlagentechnik GmbH [Germany]
Dr. C. May, Fraunhofer IPMS [Germany]

1:50 - 2:10 p. m. Invited lecture

3.03 New Perspectives in Pharmaceutical Packaging - Barrier Coatings and Beyond

Dr. T. Kälber, SCHOTT AG [Germany]

2:10 - 2:30 p. m.

3.04 All-In-Vacuum Deposited Transparent Multilayer Barriers on Polymer Substrates

J. Fahlteich, Fraunhofer FEP [Germany]

2:30 - 2:50 p. m.

3.05 High Performance Low Cost ALD Moisture Barrier Films

Dr. R. Törnqvist, Beneq [Finland]

2:50 - 3:10 p. m.

3.06 Plasma Enhanced Chemical Vapor Deposition (PECVD) of SiO2 and TiO2 for Large Area Applications

J. Madocks, General Plasma [USA]

3:10 - 3:30 p. m.

3.07 Opportunities and Challenges in Flexible Electronics

Dr. D. J. McClure, Acuity Consulting and Training [USA]

3:30 - 4:00 p. m.

Coffee Break

Session 4 - Process Control Methods and Characterization

Chairmen: Dr. K. Makita, Dr. G. Schottner

4:00 - 4:30 p. m. Keynote lecture

4.01 Optical Mapping and Imaging for Quality Control of Thin Films and Surfaces

Dr. U. Beck, Federal Institute for Materials Research and Testing BAM [Germany]

4:30 - 4:50 p. m. Invited lecture

4.02 Film Structure Modification by Inductively Coupled Plasma Assistance in Conventional and Pulsed Magnetron Sputtering

Prof. E. Kusano, Kanazawa Institute of Technology [Japan]

4:50 - 5:10 p. m.

4.03 Optical Quality Assurance and Process Control of Thin Film Solar Modules

H. Oerley, Dr. Schenk GmbH Industriemesstechnik [Germany]

5:10 - 5:30 p. m.

4.04 Development of Ga-doped ZnO Transparent Electrode for Liquid Crystal Display Panel

N. Yamamoto, Kochi University of Technology [Japan]

5:30 - 5:50 p. m.

4.05 Applied PIC-MC Simulation for Process Analysis and Facility Development

M. Siemers, Fraunhofer IST [Germany]

5:50 - 6:10 p. m.

4.06 Industrial Sputtering - Improvements in Productivity and Control for Transparent Conductive Oxides

M. Audronis, Gencoa Ltd [Great Britain]

Disclaimer: Program may be subject to change without notice.

Stadt Braunschweig